Developer composition for lithographic printing plates

Details Developer composition for lithographic printing plates Developer composition for lithographic printing plates

1979-12-21

1981-06-02

Kimlin, Ward C.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430285, 430302, 430306, 430309, 430294, 430433, 430435, 430464, 430486, G03C 500, G03C 524

Patent

active

042712610

ABSTRACT:
A developer composition for a lithographic printing plate provided with a coated layer composed of a photosensitive polymer having in the main chain thereof groups of formula (I) ##STR1## wherein X and Y independently represent hydrogen, halogen, cyano or nitro, and n is an integer of 1 or 2, comprising ethylene glycol monophenyl ether and at least one acid selected from the group consisting of a mineral acid, an organic carboxylic acid and an organic sulfonic acid.

REFERENCES:
patent: 3682641 (1972-08-01), Casler
patent: 3707373 (1972-12-01), Martinson et al.
patent: 3996054 (1976-12-01), Santemma
patent: 4055515 (1977-10-01), Kirch
patent: 4186006 (1980-01-01), Kobayashi et al.

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