Semiconductor device manufacturing: process – With measuring or testing
Patent
1998-11-21
2000-11-14
Niebling, John F.
Semiconductor device manufacturing: process
With measuring or testing
75726, 73 6142, G01N 128
Patent
active
061469092
ABSTRACT:
The specification describes an analytical technique for determining trace levels of copper in a background matrix of titanium by dissolving the titanium and the copper impurity in HF, then selectively depositing the copper on a clean silicon surface. The silicon surface is then analyzed for the trace level of copper.
Antol Joze E.
Coult David Gerald
Derkits Gustav Edward
Dietz Franklin Roy
Selamoglu Nur
Lucent Technologies - Inc.
Murphy John
Niebling John F.
LandOfFree
Detecting trace levels of copper does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Detecting trace levels of copper, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Detecting trace levels of copper will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2064067