Detecting chemiluminescent radiation in the cleaning of a...

Details Detecting chemiluminescent radiation in the cleaning of a... Detecting chemiluminescent radiation in the cleaning of a...

2005-01-18

2005-01-18

Kornakov, M. (Department: 1746)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With measuring, sensing, detection or process control means

C156S345240, C156S345290, C156S345350, C156S345510, C134S05600D

Reexamination Certificate

active

06843881

ABSTRACT:
In a substrate processing apparatus, a substrate processing chamber has a substrate support to support a substrate, a gas delivery system to provide an energized cleaning gas to the chamber to clean process residues formed on surfaces in the chamber during processing of the substrate, and an exhaust to exhaust the cleaning gas. A detector monitors a chemiluminescent radiation emitted from about a surface during cleaning of the process residues by the energized cleaning gas and generates a signal in relation to the monitored chemiluminescent radiation. A controller receives the signal and evaluates the signal to determine an endpoint of the cleaning process.

REFERENCES:
patent: 4427516 (1984-01-01), Levinstein et al.
patent: 4687544 (1987-08-01), Bersin
patent: 4689112 (1987-08-01), Bersin

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