Designer's intent tolerance bands for proximity correction...

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design

Reexamination Certificate

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C716S030000

Reexamination Certificate

active

11163264

ABSTRACT:
A method of conveying the designer's intended electrical characteristics for a semiconductor design is provided by forming tolerance bands for a design layer of interest that take into consideration constraints from design layers that interact with and influence the features on the design layer of interest. The method determines regions, i.e. tolerance bands, within which the printed edges of features of the layer of interest will print within a predetermined criterion, and satisfy a variety of constraints, including, but not limited to, electrical, overlay and manufacturability constraints arising from the influence of features on other layers. The method may be implemented in a computer program product for execution on a computer system. The resulting tolerance bands can be used to efficiently convey the designer's intent to a lithographer, an OPC engineer or a mask manufacturer or tool.

REFERENCES:
patent: 6553559 (2003-04-01), Liebmann et al.
patent: 6578190 (2003-06-01), Ferguson et al.
patent: 6871338 (2005-03-01), Yamauchi
patent: 2004/0133871 (2004-07-01), Granik et al.
patent: 2005/0086618 (2005-04-01), Ito et al.
patent: 2005/0142449 (2005-06-01), Shi et al.
patent: 2005/0216877 (2005-09-01), Pack et al.
patent: 2006/0085773 (2006-04-01), Zhang
patent: 2006/0129966 (2006-06-01), Rodin et al.
patent: 2006/0136861 (2006-06-01), Lucas et al.
Title: OPC With A Conformal Target Layout Authors: Robert M. Lugg, Daniel F. Beale, Jason Huang, Michael L. Rieger Publication: Proc. SPIE vol. 4691, p. 1091-1096, Optical Microlithography XV; Anthony Yen; Ed. Publication Date: Jul. 2002.
Title: Impact Of Subwavelength CD Tolerance On Device Performance Authors: A. Balasinski, L. Karklin, V. Axelrad Publication: Proc. SPIE vol. 4692, p. 361-368, Design, Process Integration, and Characterization For Microelectronics; Alexander Starikov, Kenneth W. Tobin, Jr.; Eds. Punlication Date: Jul. 2002.
Title: High -Performance Circuit Design For The RET-enabled 65nn Technology Node Authors: L. Liebmann, A. Barish, Z. Baum, H. Bonges, S. Bukofsky, C. Fonseca, S. Halle, G. Northrop, S. Runyon, L. Sigal Publication: Proc. SPIE vol. 5379, p. 20-29, Design and Process Integration For Microelectronic Manufacturing II, Lars W. Liebmann; Ed. Publication Date: 2004.

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