Deposition system to provide preheating of chemical vapor...

Details Deposition system to provide preheating of chemical vapor... Deposition system to provide preheating of chemical vapor...

2007-04-17

2007-04-17

Lund, Jeffrie R. (Department: 1763)

Coating apparatus

Control means responsive to a randomly occurring sensed...

Temperature responsive

C118S715000, C118S724000, C118S666000

Reexamination Certificate

active

10209840

ABSTRACT:
Chemical vapor deposition systems include elements to preheat reactant gases prior to reacting the gases to form layers of a material on a substrate, which provides devices and systems with deposited layers substantially free of residual compounds from the reaction process. Heating reactant gases prior to introduction to a reaction chamber may be used to improve physical characteristics of the resulting deposited layer, to improve the physical characteristics of the underlying substrate and/or to improve the thermal budget available for subsequent processing.

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