Deposition resistant lining for CVD chamber

Details Deposition resistant lining for CVD chamber Deposition resistant lining for CVD chamber

1998-03-24

2000-09-12

Beck, Shrive

Coating apparatus

Gas or vapor deposition

156345, C23C 1600

Patent

active

061172448

ABSTRACT:
A deposition resistant lining assembly is provided for a chemical vapor deposition chamber, the deposition resistant lining assembly including a first ceramic liner for mounting adjacent a substrate holder within the chemical vapor deposition chamber to protect a portion of an interior wall of the chemical vapor deposition chamber from deposition of material on the portion of said interior wall of the chemical vapor deposition chamber. The deposition resistant lining assembly also includes a second ceramic liner for mounting in a pumping channel formed in a peripheral region of the chemical vapor deposition chamber to protect a portion of said pumping channel from deposition of the material on the portion of the pumping channel. The first ceramic liner and the second ceramic liner are more resistant to deposition of the material than aluminum and easier and faster to clean of the material deposited thereon than aluminum.

REFERENCES:
patent: 5366585 (1994-11-01), Robertson et al.
patent: 5935334 (1999-08-01), Fong et al.

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