Deposition over mixed substrates

Details Deposition over mixed substrates Deposition over mixed substrates

2005-05-31

2005-05-31

Pham, Long (Department: 2814)

Semiconductor device manufacturing: process

Formation of semiconductive active region on any substrate

C438S482000, C438S488000, C438S489000

Reexamination Certificate

active

06900115

ABSTRACT:
Chemical vapor deposition methods are used to deposit silicon-containing films over mixed substrates. Such methods are useful in semiconductor manufacturing to provide a variety of advantages, including uniform deposition over heterogeneous surfaces, high deposition rates, and higher manufacturing productivity. An example is in forming the base region of a heterojunction bipolar transistor, including simultaneous deposition over both single crystal semiconductor surfaces and amorphous insulating regions.

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