Deposition of tungsten nitride using plasma pretreatment in...

Details Deposition of tungsten nitride using plasma pretreatment in... Deposition of tungsten nitride using plasma pretreatment in...

2005-03-29

2005-03-29

Chen, Bret (Department: 1762)

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

C427S535000, C438S785000

Reexamination Certificate

active

06872429

ABSTRACT:
A layer of tungsten nitride is deposited on the upper surface of a wafer with improved adhesion. The deposition is performed by first pretreating the wafer with a hydrogen plasma prior to performing tungsten nitride deposition.

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Lu et al. “A New Process for Depositing Tungsten Nitride Thin Films”J.Electrochem. Soc., vol. 145, No. 2, pp. L21-L23, Feb. 1998.

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