Deposition method, method of manufacturing semiconductor...

Details Deposition method, method of manufacturing semiconductor... Deposition method, method of manufacturing semiconductor...

2007-07-03

2007-07-03

Lebentritt, Michael (Department: 2812)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

Insulative material deposited upon semiconductive substrate

C438S676000, C438S771000, C438S772000, C438S765000, C438S794000, C257S760000, C257S762000, C257SE21274, C257SE21492

Reexamination Certificate

active

10867178

ABSTRACT:
The present invention relates to a deposition method of a low dielectric constant insulating film, which comprises the steps of generating a first deposition gas containing at least one silicon source selecting from the group consisting of silicon containing organic compound having siloxane bond and silicon containing organic compound having CH3group, and an oxidizing agent consisting of oxygen containing organic compound having alkoxyl group (OR: O is oxygen and R is CH3or C2H5), and applying electric power to the first deposition gas to generate plasma and then causing reaction to form a low dielectric constant insulating film on a substrate.

REFERENCES:
patent: 2002/0113316 (2002-08-01), Shioya et al.
patent: 2002/0187262 (2002-12-01), Rocha-Alvarez et al.
patent: 1 077 480 (1999-08-01), None
patent: 1 077 480 (1999-08-01), None
patent: 1 148 539 (2001-04-01), None
patent: 1 209 728 (2001-10-01), None
patent: 1 209 728 (2001-10-01), None
patent: 2000-58641 (2000-02-01), None
patent: 2002-252228 (2001-06-01), None
patent: 03/052162 (2002-12-01), None
patent: 03/095702 (2003-08-01), None

Affiliated with

Also associated with

Rating

Deposition method, method of manufacturing semiconductor... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Deposition method, method of manufacturing semiconductor..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Deposition method, method of manufacturing semiconductor... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3777598