Deposition from liquid sources

Details Deposition from liquid sources Deposition from liquid sources

2007-08-07

2007-08-07

Everhart, Caridad (Department: 2891)

Semiconductor device manufacturing: process

Formation of semiconductive active region on any substrate

C257SE21461, C427S248100, C118S726000, C438S784000

Reexamination Certificate

active

10933978

ABSTRACT:
A liquid injector is used to vaporize and inject a silicon precursor into a process chamber to form silicon-containing layers during a semiconductor fabrication process. The injector is connected to a source of silicon precursor, which preferably comprises liquid trisilane in a mixture with one or more dopant precursors. The mixture is metered as a liquid and delivered to the injector, where it is then vaporized and injected into the process chamber.

REFERENCES:
patent: 4610859 (1986-09-01), Miyagawa et al.
patent: 4684542 (1987-08-01), Jasinski et al.
patent: 4828224 (1989-05-01), Crabb et al.
patent: 4834020 (1989-05-01), Bartholomew
patent: 4849259 (1989-07-01), Biro et al.
patent: 4891103 (1990-01-01), Zorinsky et al.
patent: 5204314 (1993-04-01), Kirlin et al.
patent: 5221556 (1993-06-01), Hawkins et al.
patent: 5227329 (1993-07-01), Kobayashi et al.
patent: 5272880 (1993-12-01), Nishizato et al.
patent: 5389570 (1995-02-01), Shiozawa
patent: 5536323 (1996-07-01), Kirlin et al.
patent: 5711816 (1998-01-01), Kirlin et al.
patent: 5719417 (1998-02-01), Roeder et al.
patent: 5786027 (1998-07-01), Rolfson
patent: 5876503 (1999-03-01), Roeder et al.
patent: 6082714 (2000-07-01), Dornfest et al.
patent: 6093252 (2000-07-01), Wengert et al.
patent: 6096134 (2000-08-01), Zhao et al.
patent: 6244575 (2001-06-01), Vaartstra et al.
patent: 6258170 (2001-07-01), Somekh et al.
patent: 6273951 (2001-08-01), Vaartstra
patent: 6409839 (2002-06-01), Sun et al.
patent: 6589868 (2003-07-01), Rossman
patent: 6640840 (2003-11-01), MacNeil
patent: 2002/0168868 (2002-11-01), Todd
patent: 2002/0197831 (2002-12-01), Todd et al.
patent: 2003/0082300 (2003-05-01), Todd et al.
patent: 2003/0175650 (2003-09-01), De Ridder et al.
patent: 2005/0079692 (2005-04-01), Samoilov et al.
patent: 2006/0110930 (2006-05-01), Senzaki
patent: WO 02/064853 (2002-08-01), None

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