Depositing polysilicon films having improved uniformity and appa

Details Depositing polysilicon films having improved uniformity and appa Depositing polysilicon films having improved uniformity and appa

1995-06-07

1996-11-19

Bareford, Katherine

Coating processes

Coating by vapor, gas, or smoke

Base includes an inorganic compound containing silicon or...

4272552, 4272557, 118725, 118728, C23C 1624

Patent

active

055760597

ABSTRACT:
A barrier to prevent reactant gases from reaching the surfaces of a susceptor support for a substrate upon which polysilicon films are to be deposited provides improved uniformity of the depositing film across the substrate, and prevents substrate-to-substrate variations during sequential depositions. A suitable barrier includes a preheat ring extension that mates with an extension of the susceptor support.

REFERENCES:
patent: 4951601 (1990-08-01), Maydan et al.
patent: 5108792 (1992-04-01), Anderson et al.
patent: 5269847 (1993-12-01), Anderson et al.
Japan 59-112611 (abstract)(no date).

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