Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Reexamination Certificate
2004-10-14
2010-02-16
Huff, Mark F (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
C430S323000, C430S324000, C430S253000, C430S254000, C430S258000, C430S260000, C430S256000
Reexamination Certificate
active
07662545
ABSTRACT:
A method of making a microstructure includes selectively activating a portion of a surface of a silicon-containing elastomer, contacting the activated portion with a substance, and bonding the activated portion and the substance, such that the activated portion of the surface and the substance in contact with the activated portion are irreversibly attached. The selective activation may be accomplished by positioning a mask on the surface of the silicon-containing elastomer, and irradiating the exposed portion with UV radiation.
REFERENCES:
patent: 3682633 (1972-08-01), Curtin
patent: 3764248 (1973-10-01), Hall
patent: 4126292 (1978-11-01), Saeki et al.
patent: 4764244 (1988-08-01), Chitty et al.
patent: 5071597 (1991-12-01), D'Amato et al.
patent: 5328534 (1994-07-01), Calhoun et al.
patent: 5502144 (1996-03-01), Kuo et al.
patent: 5534609 (1996-07-01), Lewis et al.
patent: 5538674 (1996-07-01), Nisper et al.
patent: 5618903 (1997-04-01), Hoxmeier et al.
patent: 5637668 (1997-06-01), Graiver et al.
patent: 5661092 (1997-08-01), Koberstein et al.
patent: 5670598 (1997-09-01), Leir et al.
patent: 5676983 (1997-10-01), Bacher et al.
patent: 5741859 (1998-04-01), Saxena et al.
patent: 5744541 (1998-04-01), Sawaguchi et al.
patent: 5795519 (1998-08-01), Bacher et al.
patent: 5932649 (1999-08-01), Hergenrother et al.
patent: 5932677 (1999-08-01), Hoover et al.
patent: 6007914 (1999-12-01), Joseph et al.
patent: 6013711 (2000-01-01), Lewis et al.
patent: 6013715 (2000-01-01), Gornawicz et al.
patent: 6033202 (2000-03-01), Bao et al.
patent: 6072011 (2000-06-01), Hoover
patent: 6090902 (2000-07-01), Kuo et al.
patent: 6103837 (2000-08-01), Hiiro et al.
patent: 6124411 (2000-09-01), Matyjaszewski et al.
patent: 6136926 (2000-10-01), Raetzsch et al.
patent: 6153691 (2000-11-01), Gomowicz et al.
patent: 6235863 (2001-05-01), Hoxmeier
patent: 6339131 (2002-01-01), Cella et al.
patent: 6344521 (2002-02-01), Schwindeman et al.
patent: 6362288 (2002-03-01), Brewer et al.
patent: 6363183 (2002-03-01), Koh
patent: 6372532 (2002-04-01), Bao et al.
patent: 6387597 (2002-05-01), Gelbart
patent: 6403710 (2002-06-01), Ahmed et al.
patent: 6407193 (2002-06-01), Hiiro et al.
patent: 6619311 (2003-09-01), O'Connor et al.
patent: 6663820 (2003-12-01), Arias et al.
patent: 6686184 (2004-02-01), Anderson et al.
patent: 6805809 (2004-10-01), Nuzzo et al.
patent: 2002/0054862 (2002-05-01), Perron et al.
patent: 2003/0024632 (2003-02-01), Hahn et al.
patent: 2003/0180656 (2003-09-01), Matsuzawa
patent: 2005/0199584 (2005-09-01), Nuzzo et al.
patent: 2006/0084012 (2006-04-01), Nuzzo et al.
patent: 0 487 797 (1992-06-01), None
patent: 0487797 (1992-06-01), None
patent: WO 01/18857 (2001-03-01), None
patent: WO 2004/021084 (2004-03-01), None
patent: WO 2004/021084 (2004-03-01), None
patent: WO 2006/132664 (2006-12-01), None
Childs, W.R., et al., “Decal Transfer Microlithography: A New Soft-Lithographic Patterning Method”, Journal of the American Chemical Society, vol. 124, No. 45, pp. 13583-13596, (2002).
Allcock, H.R., et al., “Contemporary Polymer Chemistry—Second Edition”, published by Prentice-Hall Inc., New Jersey, pp. 146-149, (1990).
Deng, T., et al., “Using patterns in microfiche as photomasks in 10-μm-scale microfabrication”, Langmuir, vol. 15, No. 19, pp. 6575-6581, (1999).
Deng, T., et al., “Prototyping of masks, masters, and stamps/molds for soft lithography using an office printer and photographic reduction”, Analytical Chemistry, vol. 72, No. 14, pp. 3176-3180, (2000).
Douki, K., et al., “High-Performance 193-nm positive resist using alternating polymer system of functionalized cyclic olefins / maleic anhydride”, Advances in Resist Technology and Processing XVII, Proceedings of SPIE, vol. 3999, pp. 1128-1133, (2000).
International Search Report for PCT application No. PCT/US03/26751 dated Feb. 13, 2004.
Ouyang, M., et al., “Conversion of some siloxane polymers to silicon oxide by UV/Ozone photochemical processes”, Chem. Mater., vol. 12, No. 6, pp. 1591-1596, (2000).
Stevens, M.P., “Polymer Chemistry: An Introduction—Third Edition”, published by Oxford University Press, New York, pp. 276-279, (1999).
Xia, Y., et al., “Soft Lithography”, Annu. Rev. Mater. Sci., vol. 28, pp. 153-184, (1998).
Menard, E., et al., “A printable form of silicon for high performance thin film transistors on plastic substrates”, Applied Physics Letters, vol. 84, No. 26, pp. 5398-5400, (2004).
Wallraff, G.M., et al., “Lithographic imaging techniques for the formation of nanoscopic features”, Chemical Reviews, vol. 99, No. 7, pp. 1801-1821, (1999).
Reichmanis, E., et al., “Organic materials challenges for 193 nm imaging”, Accounts of Chemical Research, vol. 32, No. 8, pp. 659-667, (1999).
Houlihan, F.M., et al., “Retrospective of work at Bell Laboratories on the effect of fluorine substitution on the properties of photoacid generators”, Journal of Fluorine Chemistry, vol. 122, pp. 47-55, (2003).
Lee, K., et al., “Photolithographic technique for direct photochemical modification and chemical micropatterning of surfaces”, Langmuir, vol. 20, No. 5, pp. 1812-1818, (2004).
Childs, W.R., et al., “Decal transfer microlithography: A new soft-lithographic patterning method”, Journal of the American Chemical Society, vol. 124, No. 45, pp. 13583-13596, (2002).
Huck, W.T.S. et al., “Ordering of spontaneously formed buckles on planar surfaces”, Langmuir, vol. 16, No. 7, pp. 3497-3501, (2000).
Childs, W.R. et al., “Patterning of thin-film microstructures on non-planar substrate surfaces using decal transfer lithography”, Advanced Materials, vol. 16, No. 15, pp. 1323-1327, (2004).
International Search Report and Written Opinion dated Feb. 20, 2007 for PCT application No. PCT/US2005/036812, 15 pages.
Childs William R.
Lee Keon Jae
Motala Michael J.
Nuzzo Ralph G.
Blanchard & Associates
Huff Mark F
Sullivan Caleen O
The Board of Trustees of the University of Illinois
LandOfFree
Decal transfer lithography does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Decal transfer lithography, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Decal transfer lithography will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4166042