Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1994-10-06
1997-12-02
Nguyen, Nam
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419215, 20429808, C23C 1434
Patent
active
056931972
ABSTRACT:
A method of producing a magnetic recording medium by sputtering a layer onto a substrate by DC-magnetron sputtering from a target while exposing the target to an RF signal is described. The RF signal is effective to extend the target utilization without significantly decreasing the sputtering rate. Also disclosed is an apparatus for use forming a medium in accordance with the method of the invention.
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Bourez Allen J.
Lal Brij Bihari
Shinohara Tadashi
Dehlinger Peter J.
HMT Technology Corporation
Mohr Judy M.
Nguyen Nam
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