Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Finishing or perfecting composition or product
Patent
1991-12-09
1994-03-22
Le, Hoa Van
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Finishing or perfecting composition or product
106 2, G03C 500
Patent
active
052963365
ABSTRACT:
A dampening solution composition for lithographic printing, which comprises (a) water, and (b) a compound (A) represented by the following formula (I). ##STR1## wherein R represents a methyl group, an ethyl group, an n-propyl group or an isopropyl group, and n represents an integer of 1 to 4, is disclosed.
REFERENCES:
patent: 4116896 (1978-09-01), Garrett et al.
patent: 4416976 (1983-11-01), Schell
patent: 4560410 (1985-12-01), Burns et al.
Doi Kenichi
Ito Takashi
Osaki Katsuhiro
Sakai Takeya
Sato Toshio
Kao Corporation
Le Hoa Van
Toppan Printing Co. Ltd.
Toyo Ink Manufacturing Co. Ltd.
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