Cylindrical magnetron target and spindle apparatus

Details Cylindrical magnetron target and spindle apparatus Cylindrical magnetron target and spindle apparatus

2005-06-14

2005-06-14

VerSteeg, Steven (Department: 1753)

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

C204S298280, C204S298220

Reexamination Certificate

active

06905579

ABSTRACT:
A cylindrical magnetron target and spindle attachment apparatus for affixing a cylindrical magnetron target to a rotatable support spindle. The attachment apparatus includes a target and a spindle. The target defines a receiving portion. The spindle has a spindle plug. The spindle plug is disposed within the receiving portion of the target. The attachment apparatus increases the speed and ease of removing and installing cylindrical rotating targets onto a support spindle.

REFERENCES:
patent: 5096562 (1992-03-01), Boozenny et al.
patent: 5571393 (1996-11-01), Taylor et al.
patent: 5591314 (1997-01-01), Morgan et al.
patent: 5855744 (1999-01-01), Halsey et al.
patent: 6645358 (2003-11-01), Lupton et al.

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