Cyclodextrin derivative, photoresist composition including...

Details Cyclodextrin derivative, photoresist composition including... Cyclodextrin derivative, photoresist composition including...

2007-09-11

2009-02-24

Chu, John S (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C430S330000, C430S911000, C514S058000, C536S103000

Reexamination Certificate

active

07494761

ABSTRACT:
A photoresist film is formed on an object layer of a semiconductor device by coating the object layer with a photoresist composition including about 7 percent to about 14 percent by weight of a cyclodextrin derivative, about 0.1 percent to about 0.5 percent by weight of a photoacid generator, and a remainder of an organic solvent. The cyclodextrin derivative includes a β-cyclodextrin moiety and at least one alkyl carbonate group.

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Trotta, Francesco, Moraglio, Giovanni, Zerbinati, Orfeo, Nonnato, Antonello, “Alkyl Capped Carbonates of beta-Cyclodextrin” Journal of Inclusion Phenomena and Molecular Recognition in Chemistry 23 (1996): 269-276.

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