Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Patent
1998-11-10
2000-01-11
Pianalto, Bernard
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
427 58, 4272553, 4272557, 427331, 427344, 427574, 427581, H05H 124
Patent
active
060133384
ABSTRACT:
An improved CVD apparatus for depositing a uniform film is shown. The apparatus comprises a reaction chamber, a substrate holder and a plurality of light sources for photo CVD or a pair of electrodes for plasma CVD. The substrate holder is a cylindrical cart which is encircled by the light sources, and which is rotated around its axis by a driving device. With this configuration, the substrates mounted on the cart and the surroundings can be energized by light of plasma evenly throughout the surfaces to be coated.
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Hayashi Shigenori
Hirose Naoki
Inushima Takashi
Odaka Masakazu
Takayama Toru
Costellia Jeffrey L.
Ferguson Jr. Gerald J.
Pianalto Bernard
Semiconductor Energy Laboratory Co,. Ltd.
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