Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Patent
1997-06-13
1999-09-21
Mintel, William
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
438273, 438942, 257328, 257329, 257340, 257341, 257402, H01L 2976, H01L 2994, H01L 31062, H01L 31113
Patent
active
059565829
ABSTRACT:
A two-terminal current limiting component, includes a substrate of a first conductivity type; separated wells of the second conductivity type; a first annular region of the first conductivity type in each well; a second annular region of the first conductivity type having a low doping level between the periphery of each first annular region and the periphery of each well; an insulating layer over the second annular region and the surface portions of the substrate; a first metallization coating the upper surface of the component; and a second metallization coating the lower surface of the component.
REFERENCES:
patent: 3603811 (1971-09-01), Day
patent: 4148047 (1979-04-01), Hendrickson
patent: 4303935 (1981-12-01), Ragaly
patent: 4376286 (1983-03-01), Lidow et al.
patent: 4764480 (1988-08-01), Vora
patent: 4902636 (1990-02-01), Akiyama et al.
patent: 5055895 (1991-10-01), Akiyama et al.
patent: 5165973 (1992-11-01), Kojima et al.
patent: 5191279 (1993-03-01), Zommer
patent: 5289028 (1994-02-01), Clark et al.
patent: 5352915 (1994-10-01), Hutchings et al.
patent: 5629536 (1997-05-01), Heminger et al.
French Search Report from French patent application No. 9305886, filed May 10, 1993.
FETs Provide Current Limiting for Protection Against Shorts, 2328 Electronic Design; vol. 24, No. 12, Jun. 7, 1976, p. 160.
Ayela Christophe
Jalade Jean
Leturcq Philippe
Sanchez Jean-Louis
Mintel William
SGS-Thomson Microelectronics S.A.
LandOfFree
Current limiting circuit with continuous metallization does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Current limiting circuit with continuous metallization, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Current limiting circuit with continuous metallization will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-90815