Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2007-04-17
2007-04-17
Lee, Sin (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S271100, C430S018000, C430S325000, C430S326000, C430S311000, C430S319000, C430S327000, C430S330000, C430S331000, C525S328700, C525S384000
Reexamination Certificate
active
10989221
ABSTRACT:
A cross-linking polymer for an organic anti-reflective coating that is able to improve the uniformity of an ultra-fine photoresist pattern formed using a photolithography process and an ArF light source with 194 nm wavelength. Organic anti-reflective coatings including the same and a method for forming a photoresist pattern using the same are also disclosed. The disclosed cross-linking polymer is capable of preventing scattered reflection from a bottom film layer, eliminating standing wave effect due to alteration of thickness of the photoresist film, and increasing uniformity of the thickness of photoresist pattern. At the same time, the disclosed cross-linking pattern increases the etching velocity of the organic anti-reflective coating so that it can be easily removed.
REFERENCES:
patent: 6338934 (2002-01-01), Chen et al.
patent: 6395451 (2002-05-01), Jung et al.
patent: 6818380 (2004-11-01), Maemori et al.
patent: 6871656 (2005-03-01), Mullee
patent: 2005/0112497 (2005-05-01), Jung
Bok Cheol-Kyu
Jung Jae-chang
Moon Seung Chan
Shin Ki-Soo
Hynix / Semiconductor Inc.
Lee Sin
Marshall & Gerstein & Borun LLP
LandOfFree
Cross-linking polymer for organic anti-reflective coating,... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Cross-linking polymer for organic anti-reflective coating,..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Cross-linking polymer for organic anti-reflective coating,... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3755695