Creation of porosity in low-k films by photo-disassociation...

Details Creation of porosity in low-k films by photo-disassociation... Creation of porosity in low-k films by photo-disassociation...

2009-02-11

2011-11-22

Ghyka, Alexander (Department: 2812)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

Insulative material deposited upon semiconductive substrate

C438S787000, C257SE23145

Reexamination Certificate

active

08062983

ABSTRACT:
Porous dielectric layers are produced by embedding and removing nanoparticles in composite dielectric layers. The pores may be produced after the barrier material, the metal or other conductive material is deposited to form a metallization layer. In this manner, the conductive material is provided with a relatively smooth continuous surface on which to deposit.

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