Corrosion resistant electrostatic chuck

Electricity: electrical systems and devices – Electric charge generating or conducting means – Use of forces of electric charge or field

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361230, H02N 1300

Patent

active

054869757

ABSTRACT:
A corrosion resistant electrostatic chuck 10 for holding a silicon wafer 18 during processing with a corrosive gas has an electrically insulative layer 12 thereon protected from corrosion by a guard 14. The insulative layer 12 has a top surface 20 covered by the silicon wafer 18 and an exposed side surface 16. The guard 14 substantially encloses the exposed side surface 16 of the insulative layer 12 and protects the insulative layer 12 from a corrosive gas. The guard 14 is made of sacrificial material that corrodes at least as fast as the insulative layer 12 corrodes when exposed to the corrosive gas. The sacrificial material positioned near the exposed side surface 16 corrodes and reduces the concentration of the corrosive gas at the exposed side surface 16, thereby reducing the rate of corrosion of the insulative layer 12.

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"Data Sheet-Breathers and Bleeders," Data Sheet from Airtech International, Inc., Carson, Calif. (1993).
"Kapton General Information," Technical Brochure from DuPont de Nemours Company, Wilmington, Del. (1993).
"R/flex.RTM. 1100 High Temperature Materials," Data Sheet DS20903D, Rogers Corporation, Chandler, Ariz. (1993).

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