Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Reexamination Certificate
2005-01-18
2005-01-18
Niebling, John F. (Department: 2812)
Semiconductor device manufacturing: process
Coating of substrate containing semiconductor region or of...
Insulative material deposited upon semiconductive substrate
Reexamination Certificate
active
06844272
ABSTRACT:
Figure errors are corrected on optical or other precision surfaces by changing the local density of material in a zone at or near the surface. Optical surface height is correlated with the localized density of the material within the same region. A change in the height of the optical surface can then be caused by a change in the localized density of the material at or near the surface.
REFERENCES:
patent: 5911858 (1999-06-01), Ruffner
patent: 6607991 (2003-08-01), Livesay et al.
Folta James A.
Montcalm Claude
Taylor John S.
EUV Limited Liability Corporation
Niebling John F.
Stevenson Andre′
Thompson Alan H.
Wooldridge John P.
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