Active solid-state devices (e.g. – transistors – solid-state diode – Test or calibration structure
Reexamination Certificate
2008-03-18
2008-03-18
Nguyen, Cuong (Department: 2811)
Active solid-state devices (e.g., transistors, solid-state diode
Test or calibration structure
C257SE21529
Reexamination Certificate
active
11421855
ABSTRACT:
A method of measuring electrical characteristics of a gate dielectric. The gate dielectric is local annealed by directing a highly localized energy source at the measurement area, such that the measurement area is brought to an annealing temperature while surrounding structures are not significantly heated. While heating the measurement area, a flow of a gas containing a percentage of hydrogen, deuterium, or water vapor at a flow rate is directed to the measurement area. A charge is inducted on the measurement area and the electrical characteristics of the gate dielectric are measured using non contact electrical probing.
REFERENCES:
patent: 2003/0040132 (2003-02-01), Yamanaka et al.
patent: 2006/0289863 (2006-12-01), Iijima et al.
Bouche Eric F.
Edelstein Sergio
Pei Shiyou
Shi Jianou
Zhang Xiafang
KLA-Tencor Technologies Corporation
Luedeka Neely & Graham P.C.
Nguyen Cuong
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