Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Reexamination Certificate
2006-08-15
2006-08-15
Chu, John S. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
C430S270100, C430S905000, C430S910000, C526S270000, C526S281000, C526S282000
Reexamination Certificate
active
07090968
ABSTRACT:
The present invention includes polymers and photoresist compositions that comprise the polymers as a resin binder component. Photoresists of the invention include chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-200 nm, particularly 193 nm. Polymers of the invention contain in specified molar ratios both nitrile and photoacid labile groups that have an alicyclic moiety, particularly a bridged bicyclic or tricyclic group or other caged group. Polymers and resists of the invention can exhibit substantial resistance to plasma etchants.
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T. Wallow et al., “New Approaches to Production-Worthy 193nm Photoresists based on Acrylic Copolymers” Proceedings of the SPIE—The International Society for Optical Engineering, vol. 3333, No. 1, Feb. 23, 1998, pp. 579-586, XP002156905.
Barclay George G.
Kavanagh Robert J.
Mao Zhibiao
Chu John S.
Coreless Peter F.
Edwards Angell Palmer & Dodge
Frickey Darryl P.
Shipley Company L.L.C.
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