Copolymers having nitrile and alicyclic leaving groups and...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface

Reexamination Certificate

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Details

C430S270100, C430S905000, C430S910000, C526S270000, C526S281000, C526S282000

Reexamination Certificate

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07090968

ABSTRACT:
The present invention includes polymers and photoresist compositions that comprise the polymers as a resin binder component. Photoresists of the invention include chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-200 nm, particularly 193 nm. Polymers of the invention contain in specified molar ratios both nitrile and photoacid labile groups that have an alicyclic moiety, particularly a bridged bicyclic or tricyclic group or other caged group. Polymers and resists of the invention can exhibit substantial resistance to plasma etchants.

REFERENCES:
patent: 5212043 (1993-05-01), Yamamoto et al.
patent: 5635332 (1997-06-01), Nakano et al.
patent: 5968713 (1999-10-01), Nozaki et al.
patent: 6057083 (2000-05-01), Taylor et al.
patent: 6146806 (2000-11-01), Maeda et al.
patent: 6165674 (2000-12-01), Taylor et al.
patent: 6239231 (2001-05-01), Fujishima et al.
patent: 6692888 (2004-02-01), Barclay et al.
patent: 195 25 221 (1995-07-01), None
patent: 196 26 003 (1996-06-01), None
patent: 0 663 616 (1995-07-01), None
patent: 0 915 382 (1999-05-01), None
patent: 0 930 542 (1999-07-01), None
patent: 0 982 628 (2000-03-01), None
patent: 1 004 568 (2000-05-01), None
patent: 53 081114 (1978-07-01), None
patent: 11-171932 (1999-06-01), None
T. Wallow et al., “New Approaches to Production-Worthy 193nm Photoresists based on Acrylic Copolymers” Proceedings of the SPIE—The International Society for Optical Engineering, vol. 3333, No. 1, Feb. 23, 1998, pp. 579-586, XP002156905.

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