Contrast enhancement layer compositions, alkylnitrones, and use

Details Contrast enhancement layer compositions, alkylnitrones, and use Contrast enhancement layer compositions, alkylnitrones, and use

1991-01-08

1992-04-21

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430156, 430273, 430339, 430928, 564248, 564278, 568924, 568927, 568943, 524236, 524500, G03C 1727

Patent

active

051067234

ABSTRACT:
Contrast enhancement compositions are provided which can be used to make contrast enhancement layer photoresist composites. The composites can be used to make patterned photoresists under mid-UV light and utilize photobleachable alkylnitrones.

REFERENCES:
patent: 3416922 (1968-12-01), Sus
patent: 4677049 (1987-06-01), Griffing et al.
patent: 5002993 (1971-03-01), West et al.

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