Contact-making structure for a ferroelectric storage...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C438S003000

Reexamination Certificate

active

06958501

ABSTRACT:
A continuous contact hole is formed in an insulation layer that separates a storage capacitor from a switching transistor. All except a section of the contact hole is filled with poly-Si. A conductive, oxidizable interlayer and a conductive oxygen barrier layer are deposited on the Poly-Si in the remaining section of the contact hole such that the interlayer is completely surrounded by the poly-Si of the contact hole, the insulation layer, and the barrier layer.

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patent: 0 991 117 (2000-04-01), None
patent: WO 00/14796 (2000-03-01), None
Wolfgang Hönlein: “Neue Dielektrika für Gbit-Speicherchips” (New Dielectric for Gbit Memory Chips), Phys. B1. 55, No. 2, 1999, published by Wiley-VCH Verlag GmbH, pp. 51-53.
Shaohong Kuah et al.: Interaction of Ir and IrO2Thin Films with Polysilicon, W and WSIx,Integrated Ferroelectrics, 1997, vol. 17, pp. 479-488.
Yoon J. Song et al.: “A Novel Diffusion Barrier using Oxygen Stopping Layer for High Density FRAM”,Integrated Ferroelectrics, 2000, vol. 31, pp. 351-358, XP008027687.

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