Confined plasma with adjustable electrode area ratio

Details Confined plasma with adjustable electrode area ratio Confined plasma with adjustable electrode area ratio

2005-06-13

2010-11-23

Hassanzadeh, Parviz (Department: 1716)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

Having glow discharge electrode gas energizing means

C118S7230ER, C118S7230AN

Reexamination Certificate

active

07837825

ABSTRACT:
A plasma reactor comprises a chamber, a bottom electrode, a top electrode, a first set of confinement rings, a second set of confinement rings, and a ground extension. The top and bottom electrodes, the first and second sets of confinement rings, and the ground extension are all enclosed within the chamber. The first set of confinement rings is substantially parallel to the bottom electrode and the top electrode and surrounds a first volume between the bottom electrode and the top electrode. The second set of confinement rings is substantially parallel to the bottom electrode and the top electrode and surrounds a second volume between the bottom electrode and the top electrode. The second volume is at least greater than the first volume. A ground extension is adjacent to and surrounds the bottom electrode. The first set of confinement rings and the second set of confinement rings are capable of being raised and lowered to extend into a region above the ground extension.

REFERENCES:
patent: 4392932 (1983-07-01), Harra
patent: 4632719 (1986-12-01), Chow et al.
patent: 4954201 (1990-09-01), Latz
patent: 5089083 (1992-02-01), Kojima et al.
patent: 5292399 (1994-03-01), Lee et al.
patent: 5534751 (1996-07-01), Lenz et al.
patent: 5534752 (1996-07-01), Hua-Chu
patent: 5660673 (1997-08-01), Miyoshi et al.
patent: 5942042 (1999-08-01), Gogh
patent: 5998932 (1999-12-01), Lenz
patent: 6008130 (1999-12-01), Henderson et al.
patent: 6019060 (2000-02-01), Lenz
patent: 6074488 (2000-06-01), Grimard et al.
patent: 6178919 (2001-01-01), Li et al.
patent: 6433484 (2002-08-01), Hao et al.
patent: 6492774 (2002-12-01), Han et al.
patent: 6506685 (2003-01-01), Li et al.
patent: 6527911 (2003-03-01), Yen et al.
patent: 6744212 (2004-06-01), Fischer et al.
patent: 6823815 (2004-11-01), Han et al.
patent: 6974523 (2005-12-01), Benzing et al.
patent: 2003/0151371 (2003-08-01), Fischer et al.
patent: 2005/0016568 (2005-01-01), Choe et al.
patent: 2005/0268850 (2005-12-01), Ma
patent: 2006/0011138 (2006-01-01), Kang et al.
patent: 2006/0102283 (2006-05-01), Kwon et al.
patent: 0 660 499 (1995-06-01), None
patent: 0 665 575 (1995-08-01), None
patent: 60187911 (1987-02-01), None
patent: 99/14788 (1999-03-01), None
patent: 99/67807 (1999-12-01), None
patent: 03/043061 (2003-05-01), None
“International Search Report”, PCT Application No. PCT/US2006/023057, Mailing Date: Sep. 29, 2006.
“International Preliminary Report on Patentability”, PCT Application No. PCT/US2006/023057, Mail Date: Dec. 17, 2007.
“Malaysian Substantive Examination Report”, Malaysian Application No. PI 20062734, Mail Date: May 8, 2009.
“Written Opinion of the International Searching Authority”, PCT Application No. PCT/US2006/023057, Mail Date: Sep. 29, 2006.

Affiliated with

Also associated with

Rating

Confined plasma with adjustable electrode area ratio does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Confined plasma with adjustable electrode area ratio, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Confined plasma with adjustable electrode area ratio will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4164721