Coating apparatus – Gas or vapor deposition – Work support
Patent
1998-11-25
2000-09-12
Bueker, Richard
Coating apparatus
Gas or vapor deposition
Work support
361234, C23C 1600
Patent
active
061172464
ABSTRACT:
This invention relates to an apparatus comprising a Johnsen-Rahbek electrostatic chuck having a conductive stand-off pad and a method of fabricating the chuck. More specifically, the stand-off pad is made of a conductive polymeric material, such as a polyimide, which is disposed upon a semiconducting or partially conducting layer of the chuck. The polymeric material has a controlled resistivity within a range of about 10.sup.7 -10.sup.12 ohm-cm, which allows a wafer, or other workpiece, to be supported and retained upon the electrostatic chuck via the Johnsen-Rahbek effect.
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Hausmann Gilbert
Parkhe Vijay
Applied Materials Inc.
Bueker Richard
Fieler Erin
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