Concentration profile on demand gas delivery system...

Details Concentration profile on demand gas delivery system... Concentration profile on demand gas delivery system...

2006-03-14

2006-03-14

Zervigon, Rudy (Department: 1763)

Coating apparatus

Gas or vapor deposition

C118S726000, C118S724000, C156S345370

Reexamination Certificate

active

07011710

ABSTRACT:
Apparatus and method for delivering processing gas are provided. The apparatus for delivering processing gas from a vaporizer to a processing system comprises: a valve connected between the vaporizer and the processing system, the valve having a valve input connected to a vaporizer output and a first valve output connected to a processing system input and a second valve output connected to a bypass line; and a controller for switching the valve between the first valve output and the second valve output. The apparatus may further comprise: a second valve connected between a carrier gas source, a divert gas source and the vaporizer, the second valve having a first valve input connected to the carrier gas source, a second valve input connected to the divert gas source, and a valve output connected to a vaporizer input.

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