Compositions substrate for removing etching residue and use...

Details Compositions substrate for removing etching residue and use... Compositions substrate for removing etching residue and use...

2007-01-23

2007-01-23

Schilling, Richard L. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Removal of imaged layers

C430S331000, C134S001300, C134S002000, C134S003000, C510S175000, C510S176000, C510S254000, C510S257000

Reexamination Certificate

active

10254785

ABSTRACT:
Compositions containing certain organic solvents and a fluorine source are capable of removing photoresist and etching residue.

REFERENCES:
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Translation of Japanese application 2001-2366627; Aug. 3, 2001.

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