4. Chemistry of inorganic compounds
  5. Modifying or removing component of normally gaseous mixture

Geoffrey L. Chase

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Abatement of F2 using small particle fluidized bed

Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Halogenous component
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Addition of D 2 to H 2 to detect and calibrate atomic...

Metal fusion bonding – Process – With protecting of work or filler or applying flux
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Adsorbent based gas delivery system with integrated purifier

Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – Waste gas purifier
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Adsorbent for water removal from ammonia

Catalyst – solid sorbent – or support therefor: product or process – Solid sorbent – Aluminum containing
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Aerosol misted deposition of low dielectric organosilicate...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Profile ID: LFUS-PAI-P-2016725

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