Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...
Reexamination Certificate
2011-08-09
2011-08-09
Pyon, Harold Y (Department: 1761)
Cleaning compositions for solid surfaces, auxiliary compositions
Cleaning compositions or processes of preparing
For cleaning a specific substrate or removing a specific...
C430S329000, C430S331000, C510S178000
Reexamination Certificate
active
07994108
ABSTRACT:
An aqueous-based composition and process for removing hardened photoresist and/or bottom anti-reflective coating (BARC) material from a microelectronic device having same thereon. The aqueous-based composition includes at least one chaotropic solute, at least one alkaline base, and deionized water. The composition achieves high-efficiency removal of hardened photoresist and/or BARC material in the manufacture of integrated circuitry without adverse effect to metal species on the substrate, such as copper, and without damage to low-k dielectric materials employed in the microelectronic device architecture.
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Baum Thomas H.
Bernhard David D.
Minsek David W.
Rath Melissa K.
Wang Weihua
Advanced Technology & Materials Inc.
Chiang Timothy
Fuierer Tristan A.
Moore & Van Allen PLLC
Pyon Harold Y
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