4. Cleaning and liquid contact with solids
  5. Processes
  6. Including application of electrical radiant or wave energy...

David W. Minsek

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Composition useful for removal of post-etch photoresist and...

Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...
Reexamination Certificate

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Deep-UV anti-reflective resist compositions

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate

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Epoxy photoresist composition with improved cracking resistance

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate

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Oxidizing aqueous cleaner for the removal of post-etch residues

Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Reexamination Certificate

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Profile ID: LFUS-PAI-P-2341610

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