Composition for stripping photoresist and method for...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer

Reexamination Certificate

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Details

C438S030000, C438S126000, C438S197000, C257SE21170, C257SE21006, C257SE21051, C257SE21189, C257SE31126

Reexamination Certificate

active

07553710

ABSTRACT:
The present invention provides a photoresist stripper including about 5 wt % to about 20 wt % alcohol amine, about 40 wt % to about 70 wt % glycol ether, about 20 wt % to about 40 wt % N-methyl pyrrolidone, and about 0.2 wt % to about 6 wt % chelating agent.

REFERENCES:
patent: 5795702 (1998-08-01), Tanabe et al.
patent: 5827757 (1998-10-01), Robinson, Jr. et al.
patent: 7098539 (2006-08-01), Gotob et al.
patent: 7294518 (2007-11-01), Park et al.
patent: 2003/0144162 (2003-07-01), Chae et al.
patent: WO2003107434 (2003-12-01), None
patent: WO2004053970 (2004-06-01), None
European Patent Office Communication dated Apr. 19, 2007 enclosing European Search Report for Samsung Electronics Co., Ltd., Application No. 05108755-9-1226.

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