Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2008-11-26
2011-12-27
Walke, Amanda C. (Department: 1722)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S311000, C430S312000, C430S317000, C430S318000, C430S319000, C430S329000, C430S331000
Reexamination Certificate
active
08084184
ABSTRACT:
A composition for removing a photoresist includes a) an amine compound having a cyclic amine and/or a diamine, b) a glycol ether compound, c) a corrosion inhibitor and d) a polar solvent. The composition further includes a stripping promoter. Further disclosed is a method of manufacturing an array substrate using the composition for removing a photoresist.
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Choung Jong-Hyun
Hong Sun-Young
Huh Soon-Beom
Jang Doo-Young
Jeong Jong-Hyun
Cantor & Colburn LLP
Samsung Electronics Co,. Ltd.
Walke Amanda C.
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