Composition for preparing porous dielectric thin films

Details Composition for preparing porous dielectric thin films Composition for preparing porous dielectric thin films

2007-01-30

2007-01-30

Acquah, Samuel A. (Department: 1711)

Stock material or miscellaneous articles

Composite

Of silicon containing

C525S477000, C528S012000, C528S021000, C528S035000, C528S037000, C528S040000, C528S043000, C427S387000, C428S822000, C428S924000, C428S931000

Reexamination Certificate

active

10724732

ABSTRACT:
The present invention provides a composition for preparing porous dielectric thin films containing pore-generating material, said composition comprising gemini detergent, and/or a quaternary alkyl ammonium salt, a thermo-stable organic or inorganic matrix precursor, and solvent for dissolving the two solid components. There is also provided an interlayer insulating film having good mechanical properties such as hardness, modulus and hydroscopicity, which is required for semiconductor devices.

REFERENCES:
patent: 3615272 (1971-10-01), Collins et al.
patent: 4399266 (1983-08-01), Matsumura et al.
patent: 4999397 (1991-03-01), Weiss et al.
patent: 5965679 (1999-10-01), Godschalx et al.
patent: 6093636 (2000-07-01), Carter et al.
patent: 6107357 (2000-08-01), Hawker et al.
patent: 6231989 (2001-05-01), Chung et al.

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