Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2011-01-25
2011-01-25
Kelly, Cynthia H (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S327000, C430S330000, C430S331000, C430S913000
Reexamination Certificate
active
07875416
ABSTRACT:
A liquid-type composition for forming a photosensitive polymer complex and a method of preparing a photosensitive polymer complex containing silver nanoparticles using the same are provided. The composition for forming a photosensitive polymer complex includes a multifunctional epoxy resin, a photoacid generator, an organic solvent and a silver compound, or additionally includes a multifunctional acrylate resin and a photoinitiator, or an additive, e.g., a surfactant or a flow improver. This composition is applied, selectively exposed, and developed, thus preparing a photosensitive polymer complex, which contains silver nanoparticles uniformly dispersed and formed in the polymer pattern portion thereof through photo reduction and is therefore improved in terms of physical or chemical properties, e.g., heat resistance and wear resistance.
REFERENCES:
patent: 6391523 (2002-05-01), Hurditch et al.
patent: 6534235 (2003-03-01), Hanabata et al.
patent: 6630287 (2003-10-01), Towata
patent: 6818304 (2004-11-01), Miyako et al.
patent: 2002/0126377 (2002-09-01), Nakagawa et al.
patent: 2004/0224252 (2004-11-01), Kondo et al.
patent: 2005/0260522 (2005-11-01), Weber et al.
patent: 2007/0229953 (2007-10-01), Chen et al.
patent: 2008/0020317 (2008-01-01), Park et al.
patent: 0653763 (1995-05-01), None
patent: 2003-280184 (2003-10-01), None
patent: 2004-163580 (2004-06-01), None
patent: 10-2003-0031089 (2003-04-01), None
patent: 10-2006-0027746 (2006-03-01), None
patent: WO 99/67794 (1999-12-01), None
Wenhui Zhou et al., “An Efficient Two-Photon-Generated Photoacid Applied to Positive—Tone 3D Micofabrication”, Science 296, 1106-1109 (2002).
Tianyue Yu et al., “Chemical Amplified Positive Resists for Two-Photon Three Dimensional Microfabrication”, Adv. Mater. 2003, 15, No. 6, Mar. 17.
Jong-Jin Park et al., “Formation of Silver Nanoparticles in Photosensitive Components: Control of Size and Microfabrication”, Nano Korea 2007; p. 410, Aug. 29-31, 2007.
European Search Report dated Dec. 29, 2008, in corresponding European Application No. 07150275.1.
Ha Young Ung
Park Byung Ha
Park Jong Jin
Eoff Anca
Harness & Dickey & Pierce P.L.C.
Kelly Cynthia H
Samsung Electronics Co,. Ltd.
LandOfFree
Composition for forming photosensitive polymer complex and... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Composition for forming photosensitive polymer complex and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Composition for forming photosensitive polymer complex and... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2642547