Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1994-12-22
1997-06-10
Lesmes, George F.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430919, 430921, G03C 1492, G03C 1494, G03C 176
Patent
active
056374402
ABSTRACT:
A composition for forming a metal oxide thin film pattern which is a solution containing one or more hydrolytic metal compounds selected from the group consisting of hydrolytic organometallic compounds (e.g., metal alkoxide) and metal halides, and a water generating agent which frees water under the effect of irradiation with active rays (e.g., o-nitrobenzyl alcohol and 2-nitroethanol) and, as required, an acid generating agent which frees acid under the effect of irradiation with active rays is disclosed. A thin film pattern is formed by coating the composition onto a substrate, irradiating active rays for forming an image on the resultant photosensitive coating film, developing the same with water or an alcoholic solvent to remove the non-exposed portion, and heat-treating the substrate to convert the remaining film into a metal oxide, thereby forming a negative-type metal oxide thin film pattern.
REFERENCES:
patent: 3880659 (1975-04-01), Bailey et al.
patent: 3887372 (1975-06-01), Bailey
patent: 3887374 (1975-06-01), Brongo et al.
patent: 4284704 (1981-08-01), Fleming et al.
patent: 4740320 (1988-04-01), Treybig et al.
patent: 5230983 (1993-07-01), Inoue et al.
patent: 5234802 (1993-08-01), Nakamura et al.
patent: 5244784 (1993-09-01), Moriya et al.
patent: 5304456 (1994-04-01), Ueda et al.
Hackh's Chemical Dictionary, Grant, ed. p. 334, (1972).
Atsuki Tsutomu
Ogi Katsumi
Sasaki Go
Soyama Nobuyuki
Yonezawa Tadashi
Codd Bernard P.
Lesmes George F.
Mitsubishi Materials Corporation
LandOfFree
Composition for forming metal oxide thin film pattern and method does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Composition for forming metal oxide thin film pattern and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Composition for forming metal oxide thin film pattern and method will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-763664