Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2011-04-12
2011-04-12
Chu, John S (Department: 1722)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
C430S014000, C430S330000, C430S331000
Reexamination Certificate
active
07923200
ABSTRACT:
The present invention relates to an aqueous coating composition for coating a photoresist pattern comprising a polymer containing a lactam group of structure (1)where R1is independently selected hydrogen, C1-C4alkyl, C1-C6alkyl alcohol, hydroxy (OH), amine (NH2), carboxylic acid, and amide (CONH2), represents the attachment to the polymer, m=1-6, and n=1-4.The present invention also relates to a process for manufacturing a microelectronic device comprising providing a substrate with a photoresist pattern, coating the photoresist pattern with the novel coating material reacting a portion of the coating material in contact with the photoresist pattern, and removing a portion of the coating material which is not reacted with a removal solution.
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Anyadiegwu Clement
Cao Yi
Dammel Ralph R.
Hong Sung-Eun
Kang Wen-Bing
AZ Electronic Materials USA Corp.
Chu John S
Jain Sangya
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