Compact microwave downstream plasma system

Details Compact microwave downstream plasma system Compact microwave downstream plasma system

1997-07-14

2000-06-27

Dang, Thi

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

118723ME, C23F 102, C23C 1600

Patent

active

060802707

ABSTRACT:
A compact microwave downstream plasma system includes, within a significantly small portable housing unit, a power supply, a microwave generator, a non-linear waveguide, a circulator, a dummy load, a plasma applicator, and an igniter. The microwave generator supplies microwaves to the guide to the applicator. The guide includes several curved regions that allow for a more compact design. The applicator is configured to generate a plasma and output reactants that can be used to remove photoresist layers from a wafer within a process reactor.

REFERENCES:
patent: 5449412 (1995-09-01), Pinneo
patent: 5489362 (1996-02-01), Steinhardt et al.
patent: 5803975 (1998-09-01), Auzuki

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