Collimator for x-ray proximity lithography

Details Collimator for x-ray proximity lithography Collimator for x-ray proximity lithography

1998-11-19

2000-08-22

Church, Craig E.

X-ray or gamma ray systems or devices

Specific application

Lithography

378 85, G21K 500

Patent

active

061083976

ABSTRACT:
A new class of x-ray optic suitable for use in x-ray proximity lithography employs many mirror facets arranged in a grazing incidence geometry at a relatively large distance from the mask. Each mirror facet is substantially flat in that its radius of curvature is substantially larger than the target. Each facet creates an optically independent channel that covers the entire target. The facets are arranged so that many channels can simultaneously illuminate the target, thereby achieving high flux at the target with high uniformity. Constraints on local and global divergence at the mask are met by making the optic sufficiently small and placing it sufficiently distant from the target.

REFERENCES:
patent: 5339346 (1994-08-01), White
patent: 5604782 (1997-02-01), Cash, Jr.

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