Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Reexamination Certificate
2007-11-13
2007-11-13
Ryan, Patrick Joseph (Department: 1745)
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
C204S298110, C204S298160
Reexamination Certificate
active
09138429
ABSTRACT:
An apparatus and method for sputter depositing a magnetic film on a substrate to produce a magnetic device such as magnetic recording heads for reading digital information from a storage medium. The apparatus of the invention includes a sputtering chamber containing a target and a substrate, and a magnet array disposed within the chamber to form a substantially parallel magnetic field at a surface of the substrate. The sputtering chamber reduces interference between the magnetron and the magnet array by providing a long throw distance and/or a grounded collimator. The magnet array is preferably a circular ring.
REFERENCES:
patent: 3669860 (1972-06-01), Knowles et al.
patent: 4500409 (1985-02-01), Boys et al.
patent: 4776938 (1988-10-01), Abe et al.
patent: 4865709 (1989-09-01), Nakagawa et al.
patent: 5328583 (1994-07-01), Kameyama et al.
patent: 5366607 (1994-11-01), Lal et al.
patent: 5380414 (1995-01-01), Tepman
patent: 5455197 (1995-10-01), Ghanbari et al.
patent: 5512150 (1996-04-01), Bourez et al.
patent: 5519373 (1996-05-01), Miyata
patent: 5527438 (1996-06-01), Tepman
patent: 5583725 (1996-12-01), Coffey et al.
patent: 5589039 (1996-12-01), Hsu
patent: 5593551 (1997-01-01), Lai
patent: 5616218 (1997-04-01), Alex
patent: 5643422 (1997-07-01), Yamada
patent: 5660744 (1997-08-01), Sekine et al.
patent: 5688380 (1997-11-01), Koike et al.
patent: 5718812 (1998-02-01), Takaoka
patent: 5728276 (1998-03-01), Katsuki et al.
patent: 5807467 (1998-09-01), Givens et al.
patent: 5945008 (1999-08-01), Kisakibaru et al.
patent: 6014943 (2000-01-01), Arami et al.
Brezoczky Thomas
Hashim Imran
Lee Seh-Kwang
Ramaswami Sesh
Applied Materials Inc.
Guenzer Charles S.
Mercado Julian
LandOfFree
Collimated and long throw magnetron sputtering of... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Collimated and long throw magnetron sputtering of..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Collimated and long throw magnetron sputtering of... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3804940