Co-axial motorized wafer lift

Details Co-axial motorized wafer lift Co-axial motorized wafer lift

1996-05-20

1998-06-30

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

Work support

187268, 1984688, 414935, C23C 1600

Patent

active

057727732

ABSTRACT:
A heating and lifting mechanism for positioning a semiconductor wafer within a processing chamber is provided including a pedestal for supporting the wafer within the process chamber, a drive shaft extending downwardly from a lower region of the pedestal, which has a lead screw at a distal portion thereof, and a drive mechanism, which is coaxial with the drive shaft, for providing linear vertical translation of the shaft and pedestal. The device also includes a CONFLAT.RTM. assembly located between the pedestal and drive shaft. The CONFLAT.RTM. assembly includes upper and lower substantially flat planar plates removably connected to one another. The upper plate is connected to a lower region of the pedestal, and the lower plate is connected to an upper end of the drive shaft. The CONFLAT.RTM. assembly permits removal of the heater pedestal without removing the entire lift assembly.

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