Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate
2006-09-15
2010-12-07
Vinh, Lan (Department: 1792)
Semiconductor device manufacturing: process
Chemical etching
Vapor phase etching
C438S007000, C438S706000, C438S716000
Reexamination Certificate
active
07846848
ABSTRACT:
The embodiments of the invention relate to a method and apparatus for measuring the etch depth in a semiconductor photomask processing system. In one embodiment, a method for etching a substrate includes etching a transparent substrate in an etch chamber coupled to a vacuum transfer chamber of a processing system, transferring the transparent substrate to a measurement cell coupled to the processing system, and measuring at least one of etch depth or critical dimension using a measurement tool in the measurement cell.
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Anderson Scott
Collard Corey
Lewington Richard
Nguyen Khiem
Applied Materials Inc.
Patterson & Sheridan LLP
Vinh Lan
LandOfFree
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