Cleaning of photolithography masks

Details Cleaning of photolithography masks Cleaning of photolithography masks

2011-04-19

2011-04-19

Landau, Matthew C (Department: 2813)

Semiconductor device manufacturing: process

Formation of electrically isolated lateral semiconductive...

Recessed oxide by localized oxidation

C438S377000, C438S448000, C438S531000

Reexamination Certificate

active

07927969

ABSTRACT:
A method and an equipment for cleaning masks used for photolithography steps, including at least one step of thermal treatment under pumping at a pressure lower than the atmospheric pressure and at a temperature greater than the ambient temperature.

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patent: 2002/0083957 (2002-07-01), Reid
patent: 2004/0090605 (2004-05-01), Yogev
patent: 2005/0110985 (2005-05-01), Yogev
patent: 2006/0243300 (2006-11-01), Klingbeil et al.
patent: 1 411 388 (2004-04-01), None
French Search Report from French Patent Application 06/50805, filed Mar. 8, 2006.

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