Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Recessed oxide by localized oxidation
Reexamination Certificate
2011-04-19
2011-04-19
Landau, Matthew C (Department: 2813)
Semiconductor device manufacturing: process
Formation of electrically isolated lateral semiconductive...
Recessed oxide by localized oxidation
C438S377000, C438S448000, C438S531000
Reexamination Certificate
active
07927969
ABSTRACT:
A method and an equipment for cleaning masks used for photolithography steps, including at least one step of thermal treatment under pumping at a pressure lower than the atmospheric pressure and at a temperature greater than the ambient temperature.
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French Search Report from French Patent Application 06/50805, filed Mar. 8, 2006.
Jorgenson Lisa K.
Landau Matthew C
Mitchell James M
Morris James H.
STMicroelectronics S.A.
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