Cleaning gas and etching gas

Details Cleaning gas and etching gas Cleaning gas and etching gas

2006-11-21

2006-11-21

Webb, Gregory (Department: 1751)

Cleaning compositions for solid surfaces, auxiliary compositions

Cleaning compositions or processes of preparing

Specific organic component

C216S058000, C252S079300, C134S001300, C438S706000

Reexamination Certificate

active

07138364

ABSTRACT:
A chamber-cleaning gas and an etching gas used for a silicon-containing film according to the present invention comprise a perfluoro cyclic ether having 2 to 4 carbon atoms which are ether-linked with carbon atoms. The chamber-cleaning gas and the etching gas hardly generate a harmful waste gas, such as CF4, which is one of the causes for global warming so that they are good for environment. Further, they are a non-toxic gas or a volatile liquid, and are easy to use and are excellent in treatment of waste gas. Additionally, the chamber-cleaning gas of the present invention has an excellent cleaning rate.

REFERENCES:
patent: 4281119 (1981-07-01), Lagow et al.
patent: 5861065 (1999-01-01), Johnson
patent: 6537461 (2003-03-01), Nakahara et al.
patent: 6872322 (2005-03-01), Chow et al.
patent: 6884365 (2005-04-01), Hirayama et al.
patent: 2005/0178731 (2005-08-01), Hirayama et al.
patent: 60-77429 (1985-05-01), None
patent: 1-265086 (1989-10-01), None
patent: 4-316577 (1992-11-01), None
patent: 5-503104 (1993-05-01), None
patent: 6-87848 (1994-03-01), None
patent: 8-291299 (1996-11-01), None
patent: WO 91/09025 (1991-06-01), None

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