Class of E-beam resists based on conducting organic charge trans

Details Class of E-beam resists based on conducting organic charge trans Class of E-beam resists based on conducting organic charge trans

1980-12-08

1982-01-26

Louie, Jr., Won H.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

430322, 430270, 430311, 430321, 430339, 430344, 430338, G03C 504

Patent

active

043129366

ABSTRACT:
Novel E-beam resists and process for their use are described. These resists are conducting organic charge transfer salts. Films of these materials can be deposited by solvent casting or by sublimation. The deposited film can be made to produce a positive or negative resist image depending on the E-beam energy and exposure time. Exposure of this material to an E-beam produces patterns having differential electrical, optical and solvation properties.

REFERENCES:
patent: 3425867 (1969-02-01), Stillo
patent: 3671250 (1972-06-01), Andrews et al.
patent: 3690889 (1972-09-01), Harrison et al.
patent: 3697528 (1972-10-01), Andrews et al.
patent: 3736142 (1973-05-01), Kaspaul et al.
patent: 3779806 (1973-12-01), Gipstein et al.
patent: 4036648 (1977-07-01), Engler et al.

Affiliated with

Also associated with

Rating

Class of E-beam resists based on conducting organic charge trans does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Class of E-beam resists based on conducting organic charge trans, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Class of E-beam resists based on conducting organic charge trans will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1667186