Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Electron beam imaging
Patent
1980-12-08
1982-01-26
Louie, Jr., Won H.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Electron beam imaging
430325, 430270, 430311, 430313, 430321, 430339, 430344, 430338, G03C 504
Patent
active
043129358
ABSTRACT:
Novel E-beam resists and process for their use are described. These resists are conducting organic charge transfer salts. Films of these materials can be deposited by solvent casting or by sublimation. The deposited film can be made to produce a positive or negative resist image depending on the E-beam energy and exposure time. Exposure of this material to an E-beam produces patterns having differential electrical, optical and solvation properties.
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Engler Edward M.
Kuptsis John D.
Schad Robert G.
Tomkiewicz Yaffa
International Business Machines - Corporation
Louie, Jr. Won H.
McGee Hansel L.
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