Class of E-beam resists based on conducting organic charge trans

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Electron beam imaging

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

430325, 430270, 430311, 430313, 430321, 430339, 430344, 430338, G03C 504

Patent

active

043129358

ABSTRACT:
Novel E-beam resists and process for their use are described. These resists are conducting organic charge transfer salts. Films of these materials can be deposited by solvent casting or by sublimation. The deposited film can be made to produce a positive or negative resist image depending on the E-beam energy and exposure time. Exposure of this material to an E-beam produces patterns having differential electrical, optical and solvation properties.

REFERENCES:
patent: 3425867 (1969-02-01), Stillo
patent: 3671250 (1972-06-01), Andrews et al.
patent: 3690889 (1972-09-01), Harrison et al.
patent: 3697528 (1972-10-01), Andrews et al.
patent: 3736142 (1973-05-01), Kaspaul et al.
patent: 3779806 (1973-12-01), Gipstein et al.
patent: 4036648 (1977-07-01), Engler et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Class of E-beam resists based on conducting organic charge trans does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Class of E-beam resists based on conducting organic charge trans, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Class of E-beam resists based on conducting organic charge trans will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1667180

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.