Clamp ring for shielding a substrate during film layer depositio

Details Clamp ring for shielding a substrate during film layer depositio Clamp ring for shielding a substrate during film layer depositio

1994-12-16

1999-02-09

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

118719, 118720, C23C 1600

Patent

active

058688471

ABSTRACT:
A chamber for depositing a film layer on a substrate includes a support member on which the substrate is positioned for processing in the chamber, and a clamp ring suspended in the chamber on a chamber shield. The support member is positionable in the chamber to receive a substrate thereon, and further positionable to pass the substrate through the shield and thereby lift the clamp ring off the shield. After deposition is complete, the support member retracts through the shield, to reposition the clamp on the shield. In the event that a deposition material layer has formed between the substrate and the clamp ring, the clamp ring includes a plurality of actuators thereon which force the substrate out of the clamp ring as the clamp ring is repositioned on the shield.

REFERENCES:
patent: 4978412 (1990-12-01), Aoki et al.

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